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50-125 μ m PET copper plated film with thick substrate and high reliability solution
In the selection of flexible conductive materials, engineers often first focus on the conductivity of the copper layer - the square resistance and current carrying capacity. But a variable that is easily underestimated is the thickness of the substrate itself.
In applications that require carrying large currents, withstanding mechanical stresses, or undergoing high-temperature processes, the thickness of the substrate directly determines the material's dimensional stability, bending life, and processing yield. PET substrates with a thickness of 50-125 μ m have significant advantages in terms of tensile, tear, and thermal shrinkage resistance compared to ultra-thin substrates with a thickness of 6 μ m or 12 μ m. It is not pursuing 'extreme thinness', but pursuing' sufficient strength '- exchanging thicker PET substrates for higher reliability.
Core Positioning:50-125 μ m thick substrates are not pursued for "extreme thinness", but for "sufficient strength" - exchanging thicker PET substrates for higher reliability.
In the thickness spectrum of PET copper plated film, different thicknesses correspond to different engineering positions. 6-12 μ m is aimed at consumer electronics and portable devices, pursuing ultimate thinness and lightness; 50-125 μ m is positioned for industrial grade high reliability applications.
The 50-125 μ m substrate has higher tensile strength and tear resistance, and is not easily deformed during die-cutting, stamping, and bonding. PET itself has excellent mechanical strength, chemical stability, and low moisture absorption.
Thick substrate provides mechanical support for thick copper layer, carrying greater current. PET copper plated film has both flexibility and electrical and thermal conductivity properties, and the high thermal conductivity of copper has value in the field of heat dissipation.
Thick substrates have a larger heat capacity, and the temperature rise is slower in high-temperature processes such as reflow soldering. Advanced Institute Technology's PET copper plated film can operate without bubbling or delamination at 160 ° C/30 minutes.
The copper layer preparation of PET copper plated film adopts a dry wet combination process of "magnetron sputtering as the base layer and electroplating for thickening". Magnetron sputtering first deposits an extremely thin copper seed layer (usually at the nanoscale) on the surface of PET, providing a highly adhesive conductive substrate; Subsequently, the copper layer is thickened to the target value through pulse electroplating process. For copper layer thickness requirements of 5-25 μ m, electroplating thickening is a necessary process step.
Copper plating is performed on a thick substrate of 50-125 μ m, with a relatively wide process window. Compared with ultra-thin substrates of 6 μ m or 4 μ m, thick substrates have a larger thermal capacity and higher mechanical strength. They have better tolerance for temperature and tension fluctuations during sputtering and electroplating processes, making it easier to ensure the uniformity and adhesion of the copper layer. The bonding strength of the PET copper plated film from Advanced Institute Technology meets the 5B standard (ASTM D3359 highest grade), and the peel strength is ≥ 8N/cm. The thickness of the copper layer can be customized according to customer needs, with a common range of 500nm to 25 μ m.
Based on 50-125 μ m PET substrate, copper plated film products with different copper layer thicknesses can be prepared by precise control of electroplating thickening process. The thickness of the copper layer varies from 5 μ m to 25 μ m, and different thicknesses correspond to different performance focuses:
| Product Type | Copper layer thickness | Key Features | Typical Applications |
|---|---|---|---|
| (50-125) 5PET copper plated film | ~5 μm | Moderate copper layer, balancing conductivity and flexibility | Conventional FPC signal lines, electromagnetic shielding layer |
| (50-125) 10PET copper plated film | ~10 μm | Thick copper layer, low square resistance, good current carrying capacity | High current FPC circuit, power battery connection |
| (50-125) 12PET copper plated film | ~12 μm | Thick copper layer, low resistance, high current carrying capacity | Power lines, power modules, industrial FPC |
| (50-125) 18PET copper plated film | ~18 μm | Thick copper layer, extremely low square resistance, high current carrying capacity | High power transmission, automotive electronics, heat dissipation film |
| (50-125) 25PET copper plated film | ~25 μm | Ultra thick copper layer, lowest square resistance, highest current carrying capacity | Extreme high current applications, new energy battery current collectors |
Note: The thickness of the copper layer is the nominal reference value, and the specific performance is subject to the actual product specifications. Advanced Institute Technology's copper layer thickness can cover 0.1-8 μ m, supporting customization for ultra-thin and thickened requirements.
Selection suggestion:The thinner the copper layer, the better the flexibility and the higher the precision of thin circuit production; The thicker the copper layer, the lower the square resistance, and the stronger the current carrying capacity and thermal conductivity. Based on the comprehensive balance of current carrying capacity, bending life, and etching accuracy.
| performance metrics | typical value |
|---|---|
| substrate thickness | 50-125 μ m (customizable 4.5-188 μ m) |
| Copper layer thickness | 5-25 μ m (customizable 0.1-8 μ m) |
| Square resistance (1 μ m copper thickness) | ≤18mΩ/□ |
| Square resistance (copper thickness ≥ 2 μ m) | ≤0.05Ω/□ |
| Square resistance uniformity | Within ± 5% |
| adhesion | 5B level (hundred grid method) |
| peel strength | ≥ 8N/cm (180 ° peel test) |
| Bend-resistant | R0.5 bending radius ≥ 100000 times |
| heat resistance | 160 ° C/30min without bubbling or layering |
| Operating temperature | -40 ° C to 120 ° C |
| wide width | Maximum 1350mm |
Pinhole density ≤ 0.1 per square meter.
Double sided copper plated composite copper foil replaces traditional electrolytic copper foil, and the thick substrate and copper layer meet the requirements of high current carrying capacity and structural strength. Weight reduction of over 30%, PET insulation layer provides cushioning isolation.
A thick copper layer (10-25 μ m) combined with a thick PET substrate provides sufficient current carrying capacity and structural reliability. Replace traditional wiring harnesses in the fields of automotive electronics, industrial control, and new energy.
The high-purity oxygen free copper conductive layer provides conductivity and thermal conductivity properties, and is used for shielding communication equipment and high-speed cables. The thick copper layer (18-25 μ m) has outstanding thermal conductivity and is suitable for dual demand scenarios of conductivity and thermal management.
5 μ m is suitable for signal lines; 10-12 μ m is suitable for power lines; 18-25 μ m is suitable for high-power transmission and high current scenarios.
50 μ m is suitable for conventional industry; 75 μ m provides higher strength; 125 μ m is designed for scenarios that require extremely high dimensional stability and tear resistance.
Priority should be given to selecting 5-10 μ m thin copper layers for dynamic bending. Thick substrates have good processing windows in etching, bonding, and welding, and support customization of single-sided/double-sided copper plating.
The essence of 50-125 μ m PET copper plated film is to strike an engineering balance between the thinning and structural strength of PET substrate. It does not pursue "extreme thinness", but rather "sufficient strength" - exchanging thicker PET substrates for higher mechanical strength, better dimensional stability, and stronger current carrying capacity. In engineering scenarios where FPC is required to carry high currents, withstand mechanical stress, or undergo high-temperature processes, 50-125 μ m provides a reliable guarantee that thin substrates cannot replace.
On this thickness platform, customizing products with different current carrying capacities by adjusting the thickness of the copper layer (from 5 μ m to 25 μ m) is a key step in transforming "thick substrates" into specific engineering solutions. From composite current collectors for power batteries to high current FPCs, from electromagnetic shielding to heat dissipation management -50-125 μ m PET copper plated film is transforming the engineering choice of "thicker" into a reliable material option in high reliability application scenarios.
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