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12.5 μ m PI copper plated film · FPC gold thickness
In the design of flexible printed circuit boards (FPCs), substrate thickness is a core parameter that can affect the entire body.
Too thin - Although the 7 μ m PI substrate is extremely thin and light, it has high processing difficulty and strict yield control, and is not suitable for every scenario in large-scale production. Too thick -25 μ m PI substrate has better mechanical strength, but for dynamic FPCs that require frequent bending (such as the hinge area of foldable phones), the bending performance is not ideal.
12.5 μ m is in a special position: it achieves the industry recognized optimal balance between processability, bending life, and cost in FPC manufacturing. It does not have the extremely high requirements for processing technology like 7 μ m, nor does it exhibit stiffness in frequent bending like 25 μ m. It is precisely this "just right" that makes 12.5 μ m one of the most widely used and widely used thickness specifications in the FPC industry.
Core Positioning:The engineering value of the 12.5 μ m PI copper plated film is achieved through vacuum sputtering copper plating process on this thickness platform - it allows the PI film to retain its original excellent properties (high temperature resistance, insulation, mechanical strength) while obtaining the conductivity, thermal conductivity, and electromagnetic shielding capabilities endowed by the copper layer.
In the structure of FPC, the substrate (BASE FILM) is usually made of polyimide (PI) film, with commonly used thicknesses of 12.5 μ m and 25 μ m. The reason why 12.5 μ m has become the industry standard is due to its comprehensive advantages in multiple engineering dimensions:
The 25 μ m substrate is relatively hard and its bending performance is not as good as 12.5 μ m. For dynamic applications such as folding screen hinges and sliding cover cables, 12.5 μ m is a better choice.
When FPC is bound to LCD, a reinforcing film needs to be designed on the back of the contact surface. The standard solution uses 12.5 μ m PI, which requires extremely high precision.
A fine circuit with a spacing of 50 μ m (25 μ m line width/line spacing) can be achieved on a 12.5 μ m PI, making it an ideal substrate for high-density FPC.
Compared to 7 μ m, 12.5 μ m has better dimensional stability in coating, etching, and bonding, higher process tolerance, and better mass production yield.
The copper layer of 12.5 μ m PI copper plated film was prepared using roll to roll (R2R) vacuum magnetron sputtering process. In a highly vacuum environment, high-purity copper is used as the target material, and copper atoms are sputtered out through high-energy particle bombardment. Under the action of electric and magnetic fields, they deposit on the surface of PI thin films, forming a uniform and dense copper film. This process usually uses a combination of "sputtering electroplating" to produce, and the non adhesive structure eliminates the need for adhesive layers in traditional FCCL products, significantly reducing the overall thickness of the material.
Eliminate impurities such as oxygen and nitrogen, avoid oxidation or nitridation of the coating, and ensure high purity and excellent conductivity of the copper film.
Accurately control the thickness and uniformity of the copper film to ensure consistent coating throughout the entire width range and meet the requirements of fine wire processing.
Advanced Institute Technology products have a coating adhesion of 5B level (the highest level of ASTM D3359), excellent bending resistance, and no cracks after ten bends.
Process maturity:Compared to 7 μ m ultra-thin substrates, 12.5 μ m substrates have higher mechanical strength and thermal capacity, better tolerance for temperature and tension fluctuations, easier assurance of copper layer uniformity and adhesion, and high stability in mass production.
Based on a 12.5 μ m PI substrate, copper plated film products with different copper layer thicknesses can be prepared by precisely controlling the sputtering and electroplating process parameters. The advanced technology copper layer covers a thickness of 0.1-8 μ m, which can meet diverse needs from ultra-thin to thickened. The thickness of the copper layer varies from 0.1 μ m to 3.6 μ m, and different thicknesses correspond to different performance focuses:
| Product Type | Copper layer thickness | Key Features | Typical Applications |
|---|---|---|---|
| 12.5 0.1PI copper plated film | ~0.1 μm | Extremely thin copper layer, highest flexibility, suitable for high-precision thin circuits | High density FPC thin lines, COF substrates, sensor electrodes |
| 12.5 0.3PI copper plated film | ~0.3 μm | Thin copper layer, good flexibility, moderate conductivity | Thin line spacing FPC signal line, LCD binding FPC |
| 12.5 1PI copper plated film | ~1 μm | Medium copper layer, with balanced conductivity and flexibility | Conventional FPC signal lines, electromagnetic shielding layer |
| 12.5 3.6PI copper plated film | ~3.6 μm | Thick copper layer, low resistance, high current carrying capacity | High current FPC circuit, power supply circuit, high-frequency signal transmission |
Note: The thickness of the copper layer is the nominal reference value, and the specific performance is subject to the actual product specifications. Advanced Institute Technology supports flexible customization of copper layer thickness ranging from 0.1 to 8 μ m.
Selection suggestion:The thinner the copper layer, the better the flexibility and suitability for high-precision fine circuits; The thicker the copper layer, the stronger the conductivity and higher the current carrying capacity. The thickness of the copper plating layer on the 2L-FCCL structure can be controlled between 2-8 μ m, which is suitable for the production of thin circuit (Pitch<30 μ m) products. >
The performance advantage of 12.5 μ m PI copper plated film comes from the synergistic effect between PI substrate and copper layer. Based on the comprehensive advanced technology and industry public information, the key performance indicators are as follows:
The thermal decomposition temperature of PI film is>500 ° C, the coefficient of thermal expansion (CTE) is ≤ 25ppm/℃, and it can withstand a reflow soldering temperature of 260 ° C. The thermal stability of advanced technology products can reach 260 ° C.
Tensile strength ≥ 170MPa, elongation at break ≥ 5%, high tensile strength, good flexibility, suitable for complex shapes.
Copper layer provides excellent conductivity, suitable for high-frequency signal and power transmission; PI substrate maintains high insulation performance.
The bonding strength is 5B grade (the highest ASTM grade), and the copper film is tightly bonded to PI. Fine lines with a spacing of 50 μ m (25 μ m line width/line spacing) can be achieved on a 12.5 μ m PI.
The most classic application. The FPC end bound to the LCD needs to be reinforced with film, and the standard is 12.5 μ m PI to meet the requirements of accuracy and flexibility.
Supports fine lines with a spacing of 50 μ m (25 μ m line width/line spacing) for high-density interconnect (HDI) FPC and COF substrates.
Vacuum sputtering deposition of copper layer to endow the surface of PI with conductivity and thermal conductivity, used for EMI protection of electronic products.
In devices such as smartphones, tablets, smartwatches, TWS earphones, etc., 12.5 μ m PI copper plated film is the core material of FPC signal lines.
The thinner the copper layer, the higher the etching accuracy, suitable for thin and wide line spacing. 12.5 0.1/0.3PI is suitable for high precision, while 12.5 1/3.6PI is suitable for current carrying lines.
The thinner the copper layer, the better the fatigue resistance, making it suitable for dynamic bending scenarios such as folding screens.
The thicker the copper layer, the lower the square resistance, and the stronger the current carrying capacity. Therefore, thicker specifications should be selected for power lines.
Binding applications requires attention to substrate thickness accuracy and copper layer uniformity. Advanced Institute Technology PI copper plating film thickness 5-125 μ m, copper layer 0.5-50 μ m, width 0.5-500mm, full-size customization.
The essence of 12.5 μ m PI copper plated film is to find the optimal balance between the processability, bending performance, and cost of FPC as an engineering product. It is not the thinnest or thickest, but it is the "just right" choice in most FPC application scenarios: capable of supporting the production of thin lines with a spacing of 50 μ m, meeting the accuracy requirements of LCD binding, providing reliable bending life, while maintaining high yield and controllable cost in mass production.
For FPC design engineers, understanding the engineering logic behind the thickness of 12.5 μ m - why it is 12.5 instead of 7 or 25- is more valuable than simply remembering a specification. On this thickness platform, customizing products with different properties by adjusting the copper layer thickness (from 0.1 μ m to 3.6 μ m) is a key step in transforming the "golden thickness" into specific engineering solutions.
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