
Hotline:0755-22277778
Tel:0755-22277778
Mobile:13826586185(Mr.Duan)
Fax:0755-22277776
E-mail:duanlian@xianjinyuan.cn
2.3 μ m PET copper plated film · ultra-thin composite current collector scheme
In the field of lithium battery composite current collectors and flexible electronics, substrate thickness is a physical quantity that is continuously compressed. The thickness of PET film has gradually decreased from the early 50 μ m and 25 μ m to 12 μ m, 6 μ m, and 4.5 μ m, and has now been advanced to 2.3 μ m.
What is the concept of 2.3 μ m? The diameter of a standard adult hair is approximately 60-80 μ m. The thickness of PET film with a thickness of 2.3 μ m is only about one thirtieth of the diameter of a hair. At this scale, PET film is approaching its physical limit as an independent film - thinner means facing significant process challenges in processes such as coating, slitting, and winding. Industry data shows that ultra-thin PET substrates suitable for copper plating typically have a thickness of 1.6 μ m or more. 2.3 μ m is located at the core of this limit range.
Core proposition:It is precisely this "extreme thinness" that makes the 2.3 μ m PET copper plated film irreplaceable in applications that require extreme lightweight, such as lithium battery composite current collectors. The composite copper foil made of 2.3 μ m PET base film has a polymer support layer mass that is only a very small part of traditional 6 μ m copper foil, which is expected to reduce the mass of the negative electrode current collector to about 30% of traditional copper foil.
The copper layer of 2.3 μ m PET copper plated film was prepared using roll to roll vacuum magnetron sputtering process. Place the rolled PET film into a vacuum chamber and use high-purity copper with a purity of 99.99% or higher as the target material. Through physical vapor deposition (PVD), copper atoms are uniformly deposited on the surface of PET to form a dense, low defect conductive seed layer. Subsequently, the copper layer was thickened to the target thickness through a water electroplating process, forming a direct composite structure of a non adhesive "PET substrate copper layer".
Copper plating on ultra-thin substrates with a thickness of 2.3 μ m faces a series of technical challenges that are far more stringent than conventional thickness substrates:
The temperature resistance of PET film is about 180 ℃, while the local temperature during the evaporation process can reach 1400-1500 ℃. If too much heat accumulates, the film will shrink, warp, or even burn through to form holes.Advanced Institute of TechnologyBy precisely controlling the sputtering power and substrate operating speed, the substrate temperature rise is controlled within a safe range.
The mechanical strength of 2.3 μ m film is extremely limited, and excessive tension during unwinding and unwinding can cause the film to stretch, deform, or even break. The precise low tension closed-loop control system is the core technological threshold for the mass production of ultra-thin PET copper plated film.
High energy ion bombardment during magnetron sputtering can easily cause polymer film perforation and reduce yield. Advanced Institute Technology optimizes plasma pretreatment and sputtering parameters to reduce damage to ultra-thin substrates while ensuring coating density.
PET material itself has no active functional groups and strong hydrophobicity, making it difficult to form a metal coating with excellent adhesion on the surface. The plasma pretreatment process developed by Advanced Institute Technology effectively improves the bonding strength between PET and copper layer by bombarding the substrate surface with plasma, achieving a coating adhesion of 5B level (the highest level of ASTM D3359) and a peel strength of ≥ 1.5N/mm.
Based on a 2.3 μ m PET substrate, copper plated film products with different copper layer thicknesses can be prepared by precisely controlling the sputtering and electroplating process parameters. The thickness of the copper layer varies from 0.07 μ m to 0.7 μ m, and different thicknesses correspond to different performance focuses:
| Product Type | Copper Layer Thickness | Key Characteristics | Typical Applications |
|---|---|---|---|
| 2.3 0.07PET copper plated film | ~0.07 μm | Extremely thin copper layer, semi transparent, extremely flexible | Ultra thin electromagnetic shielding layer, transparent conductive circuit, sensor electrode |
| 2.3 0.1PET copper plated film | ~0.1 μm | Extremely thin copper layer, good transparency, high flexibility and toughness | High density FPC thin circuit, precision sensor, transparent LED display |
| 2.3 0.3PET copper plated film | ~0.3 μm | Thin copper layer, moderate conductivity, good flexibility | Thin line FPC signal line, lithium battery composite current collector |
| 2.3 0.7PET copper plated film | ~0.7 μm | Medium copper layer, low square resistance, balanced conductivity | Lithium battery composite current collector, electromagnetic shielding layer, flexible connection |
Note: The thickness of the copper layer is the nominal reference value, and the specific performance is subject to the actual product specifications.
When selecting, engineers should weigh the requirements of conductivity, transparency, and current carrying capacity comprehensively: the thinner the copper layer (0.07-0.1 μ m), the better the flexibility and transparency, suitable for high-precision thin circuits and transparent applications; The thicker the copper layer (0.3-0.7 μ m), the lower the square resistance, and the stronger the conductivity and shielding effectiveness. Advanced Institute Technology can control the square resistance within the range of 0.01-1 Ω/□ by adjusting the sputtering power or chemical plating time, meeting the low resistance requirements of high-frequency circuits, electromagnetic shielding and other scenarios.
comprehensiveAdvanced Institute of TechnologyAccording to industry public information, the key performance characteristics of 2.3 μ m PET copper plated film are as follows:
This is the most popular application direction for 2.3 μ m PET copper plated film. The composite copper foil adopts a sandwich structure of "metal conductive layer polymer material support layer metal conductive layer", with PET film as the intermediate substrate, and copper layers deposited on both sides. The ultra-thin PET substrate with a thickness of 2.3 μ m significantly reduces the quality of composite copper foil - studies have shown that, PET@Cu The quality of the composite current collector is only 30% of that of commercial copper foil, and it exhibits superior specific capacity, cycle stability, and rate performance. In addition, polymer materials have excellent ductility, and even if the battery breaks due to compression, thinner copper layer fragments are not easy to pierce the polymer material, which can greatly reduce the risk of internal short circuits.
The ultra-thin PET substrate of 2.3 μ m is suitable for FPC products that require extreme thinning and high bending life. The adhesive free structure eliminates the adhesive layer in traditional FCCL, significantly reducing the overall thickness of the material. The characteristics of sputtered copper materials are similar to those of ED Copper electrolytic copper, but the crystalline particles and capillary pores are more detailed. Can be applied to soft boards, 5G antenna soft board materials, eTag applications, transparent LED displays, and other scenarios.
2.3 μ m PET copper plated film combined with microgrid copper structure design can achieve conductivity and electromagnetic shielding functions while maintaining high transmittance. The ultra smooth copper layer surface treatment technology reduces the surface roughness to Ra ≤ 50nm, which is suitable for 5G communication scenarios that are sensitive to high-frequency losses.
When engineers choose 2.3 μ m PET copper plated film, the following dimensions deserve special attention:
Selection warning:At a scale of 2.3 μ m, 'thinner' is not necessarily superior in all dimensions. The selection of copper layer thickness requires a balance between conductivity, transparency, flexibility, and current carrying capacity - lithium battery composite current collectors pursue low resistance and current carrying capacity, while transparent electronic applications pursue transparency and flexibility. The optimal copper layer thickness for the two may differ by several times.
The essence of 2.3 μ m PET copper plated film is an engineering product that pushes the thickness of PET film to its physical limit. It is not simply "thinning" - at a scale of 2.3 μ m, material tension control, temperature management, perforation suppression, and coating uniformity all face engineering challenges that are far more stringent than conventional thickness substrates. It is precisely these boundary conditions that have been overcome one by one that enable the 2.3 μ m PET copper plated film to move from the laboratory to mass production, becoming the core material for applications such as lithium battery composite current collectors, high-density FPCs, and transparent electronics.
From the safety upgrade of power batteries to the thinning of transparent LED displays -2.3 μ m PET copper plated film is transforming the simple engineering goal of "thinner" into tangible performance improvement and cost optimization. For engineers, understanding the process constraints and performance opportunities behind the thickness of 2.3 μ m - why it is 2.3 μ m instead of thinner, and how to choose the thickness of the copper layer - is more valuable than simply remembering a specification.
www.avanzado.cn
© 2026 Xianjin Yuan · 2.3 μ m PET Copper Plating Film Technology Reference
Advanced Institute (Shenzhen) Technology Co., Ltd, © two thousand and twenty-onewww.xianjinyuan.cn. All Rights Reserved.Guangdong ICP No. 2021051947 sitemap