Evaporated ITO film is a transparent conductive film, mainly composed of indium oxide and tin oxide

    Evaporated ITO filmIt is a transparent conductive film mainly composed of indium oxide and tin oxide. It has the characteristics of high transparency, low resistivity, excellent conductivity, and chemical stability, and is therefore widely used in fields such as transparent electrodes, solar cells, liquid crystal displays, touch screens, etc.

Evaporation is a common method for preparing ITO thin films. Below, we will analyze in detail the preparation process and characteristics of evaporation ITO thin films.

1、 The preparation process of evaporated ITO thin film:

(1) The first step in substrate cleaning and treatment is to clean and treat the substrate. Generally speaking, the substrate used is glass or polymer film. The purpose of substrate cleaning is to remove impurities such as dust and oil on the surface to ensure the quality of the film. The purpose of the treatment is to increase the hydrophilicity of the substrate surface, in order to facilitate the adhesion and growth of the film. The processing methods include oxygen plasma treatment, ultraviolet irradiation, chemical treatment, etc.
(2) Evaporation of ITO film: The ITO target is placed in a vacuum chamber and heated by electron beam, ion beam, or other methods to evaporate it. The evaporated target material will deposit on the substrate surface to form a thin film. During the evaporation process, it is necessary to control parameters such as evaporation rate and substrate temperature to obtain a uniform and dense thin film.
(3) After the deposition of the thin film is completed, post-processing is required. Generally speaking, post-processing mainly includes annealing and oxidation treatment. Annealing can eliminate internal stress in thin films, improve their crystallinity and conductivity. Oxidation treatment can increase the chemical stability and antioxidant properties of the film.

2、 Characteristics of evaporated ITO film:

(1) High transparency ITO film has high transparency, with a transmittance of up to 80% in the visible light range! On (MISS).
(2) Low resistivity ITO thin films have low resistivity, which can reach around 10 ^ -4 Ω· cm at room temperature. This means that ITO thin films can be used to produce high-precision electronic components.
(3) ITO thin films have excellent conductivity and can conduct current at high frequencies, making them widely used in fields such as RFID.
(4) ITO film has good chemical stability and can be used for a long time in oxidative environments.
(5) ITO film has a wide range of applications and is suitable for different types of substrates, such as glass, polymers, etc. Meanwhile, it can also adjust its conductivity and transparency by controlling the evaporation conditions.

In summary, vapor deposition of ITO film is a commonly used method for preparing ITO film. It has the characteristics of high transparency, low resistivity, excellent conductivity, and chemical stability, and is widely used in fields such as transparent electrodes, solar cells, liquid crystal displays, touch screens, etc.